Velocity controlled anodization nanolithography with an atomic force microscope using Faradaic current feedback

A technique, called velocity controlled anodization nanolithography, is presented that ensures line continuity during atomic force microscope based local anodic oxidation on silicon. Spontaneous current spikes disrupt the generation of uniform silicon oxide patterns during lithography at low humidity. Varying the translational speed during lithography in response to the current fluctuations enables the formation of a more complete and continuous oxide layer. The velocity corrections as a result of control are able to maintain constant current flow through the tip-sample interface. The authors demonstrate that this method is effective for in situ quality control. © 2007 American Institute of Physics. DOI: 10.1063/1.2711377